Assing device
It is a versatile and compact device that enables etching, ashing, and ion cleaning!
The "Ashing Device" is a mass production equipment capable of fully automated continuous processing of substrates up to a maximum of 12 inches in diameter. It is a versatile device that enables etching, ashing, and ion cleaning by switching gas types and plasma modes. 【Features】 ■ Switchable between RIE mode and DP mode ■ Reduced metal contamination through special surface treatment ■ Compact footprint ■ Independent application of two frequencies ■ Ultra-low temperature cooling stage Multi-chamber specifications, as well as custom designs for square substrates, can also be manufactured. *Please also refer to the PDF materials. *Feel free to contact us.
- Company：ジャパンクリエイト
- Price：Other
